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Etching solution for Titanium on Silicon Wafer
Melstrip TI-3960
Lyog5aSW6YOo44K144Kk44OI6KGo56S655So44GuQ1NT44GM44GT44GT44Gr5YWl44KK44G+44GZ44CCICovDQoJLmhvZ2Ugew0KDQoJfQ==
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＞ Melstrip TI-3960
Chemicals
Semiconductor
Etching
Titanium
Melstrip TI-3960
Lyog5aSW6YOo44K144Kk44OI6KGo56S655So44GuQ1NT44GM44GT44GT44Gr5YWl44KK44G+44GZ44CCICovDQoJLmhvZ2Ugew0KDQoJfQ==
Melstrip TI-3960 is etching solution for titanium on silicon wafer.
◆Features
1. Acidic titanium etching solution containing fluoride compound.
2. Etching rate is 150 - 200 nm/min under optimum condition.
Lyog5aSW6YOo44K144Kk44OI6KGo56S655So44GuQ1NT44GM44GT44GT44Gr5YWl44KK44G+44GZ44CCICovDQoJLmhvZ2Ugew0KDQoJfQ==
Lyog5aSW6YOo44K144Kk44OI6KGo56S655So44GuQ1NT44GM44GT44GT44Gr5YWl44KK44G+44GZ44CCICovDQoJLmhvZ2Ugew0KDQoJfQ==
Lyog5aSW6YOo44K144Kk44OI6KGo56S655So44GuQ1NT44GM44GT44GT44Gr5YWl44KK44G+44GZ44CCICovDQoJLmhvZ2Ugew0KDQoJfQ==
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Cyan free
Fluoride free
Lead-free
Hexavalent chromium free
Heavy metal free
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