低磷高硬度化学镀镍溶液
※ Enplate NI-426
Chemicals
Electronic
Plating
Nickel
※ Enplate NI-426
※本产品仅可在日本、马来西亚、印度尼西亚、泰国、菲律宾、文莱、越南、新加坡、韩国、台湾、香港和中国销售，需签署许可协议。
◆特点
1.低磷含量（1~3 wt%）。
2.稳定性优异。
3.高硬度（650~700 Hv）。
4.镀层平滑均匀。
5.低应力、低电阻。
6.可焊性优异。
7.新配液时的沉积速度为 20~24 μm/h。
◆特点
1.低磷含量（1~3 wt%）。
2.稳定性优异。
3.高硬度（650~700 Hv）。
4.镀层平滑均匀。
5.低应力、低电阻。
6.可焊性优异。
7.新配液时的沉积速度为 20~24 μm/h。
无铅
无重金属
Coating Hardness
ENPLATE NI-426 is a high-hardness type. It has a hardness of 700 Hv immediately after plating, but the hardness increases further with heat treatment at several hundred degrees Celsius. The maximum hardness is achieved around 400°C, and beyond that point, the hardness decreases rapidly.
Influence of pH
ENPLATE NI-426 can be used over a wide pH range, but the deposition rate and phosphorus content are affected by pH. Around pH 7, the phosphorus content is approximately 2%, while at pH 4.5, it is 6%. The deposition rate tends to increase with higher pH.